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Стартап

DateDate: 20-12-2018, 06:01

Personal non-property and property rights for the invention belong to the author and protected under current legislation.
Platform "Innovator" in the presentations of innovations of various kinds of areas and different subjects thoroughly and deeply analyze the market of ideas and inventions, to avoid copyright infringement. In today's presentation there is a similar project of the canadian inventors, but the author's idea of smart clip "Innovator" there are innovative and promising. 
 Smart-clip "Innovator" is an attribute of decoration, mainly of women, which is made sufficiently large innovation potential and functionality. In the first place smart-clip can change its color depending on the wishes of its user. A small flexible touch panel gives the action an opportunity that is adjusted and controlled by the mobile app. Mobile app smart jewelry "Innovator" will be presented in another presentation with more complete and accurate layout of its functionality.
 Also, the smart clip will have his body camera, which under normal pairing with Your gadget, you can remove everything that happens around like record mode, and in the mode on-line. Simplifies the process of selfie mode, smart-clip with standing in front of the mirror.
 In a more complete set is possible to install a speaker and microphone for identical work smart-clip, like bluetouth headset. That is, smart-clip fully replaces the work bluetouth headset, and thus serves as an ornament, which, in manual or automatic mode adapts to the environment. The signal from the camera to the smart clip is transmitted to the screen paired with her gadget that is handy enough. Charging can be carried out both in a standard way, and with new wireless charging technology. 
 Considers the investment component or full redemption of the author's ideas.
+380505238948

DateDate: 20-12-2018, 05:56

Gordon Moore's law, which we have repeatedly mentioned on the pages of our website, says that in order to maintain a stable pace of development of computational technologies, the number of transistors in computer processors must double every two years. The electronics industry has been able to comply with this law for several decades, but now the technology has already come close to the limits, where some restrictions come into force related to the minimum allowable dimensions of individual parts of electronic components. However, engineers from the Massachusetts Institute of Technology and the University of Colorado have developed a new technological process that allows to produce “three-dimensional” transistors, the dimensions of which are three times smaller than the dimensions of the smallest transistors used now in commercial products.
Not so long ago, the industrial standard for chip production was the technology at 14 nm. Nanometers in this case mean the size of the channel, the main component that determines the size of the transistor. Currently, the standard is technology at 10 nm, but some chip makers are already beginning to transition to 7-nm technology. In the meantime, researchers from various companies, including IBM, are working to create a 5nm process technology.
New transistors, created by researchers, have dimensions of 2.5 nm, which is half the size of even experimental transistors under development. The key point of the new process is microproduction technology, called thermal atomic layer etching (thermal ALE). In this process, a billet of semiconductor material, gallium-indium arsenide, which is subjected to treatment with hydrogen fluoride, is taken, which allows to obtain a thinnest layer of metal fluoride on the semiconductor surface.
After that, the resulting base is treated with an organic substance called DMAC (dimethylaluminum chloride), which chemically reacts with metal fluoride. When the DMAC substance deposited on certain surface areas is removed, the thinnest atomic metal layer is removed with it. At one stage of such processing, a metal layer is removed at 0.02 nm, which allows for extremely high-precision engraving, which requires repeating the process hundreds and thousands of times.
“It’s like cleaning the onion head by layers,” says lead researcher Wenjie Lu, “At each stage, we take only two percent of one nanometer, which gives us super high precision, provides complete control over the process, which allows reduce to a minimum the scrap rate in the production. ”
The researchers used a new engraving technology to manufacture FinFET transistors (Fin Field-effect transistor), transistors with a three-dimensional structure, which are recently beginning to be widely used in electronics. In addition to small size, the basic performance of new transistors is 60 percent higher than the similar characteristics of existing transistors, and the unusually high ratio of channel resistance in the closed and open state makes the new transistors extremely effective in terms of the energy they use to work.
“We believe that the results of our work will have a huge impact on the world around us in the very near future,” says Wenji Liu, “We managed to gain control over the production of nanoscale devices at the atomic level. As we have demonstrated, this will further reduce the size of transistors and support Gordon Moore's law for some time. ” A source